17th International Conference on Ion Beam Modification of Materials

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Simulation of Xenon Implantation into nuclear materials and comparison with experiment

Zeke Insepov*, Di Yun, Jeff Rest, and Abdellatif Yacout

poster presentation: Tuesday 2010-08-24 05:00 PM - 07:00 PM in section Irradiation effects in insulators and nuclear materials
Last modified: 2010-06-02

Abstract


The distributions of defects in various nuclear materials such as Mo, UO2, and CeO2 as a surrogate material for UO2, formed by sub-MeV Xenon ion implantation were studied via TRIM and atomistic molecular dynamics codes and the results were compared with distributions from experiments where CeO2 and Ce/LaO2 crystals were implanted with different Xe concentrations up to doses of 1 x 1017 ions/cm2 at room temperature and 600°C.

TEM (Transmission Electron Microscopy) experiments were used to study the evolution of defect clusters during implantation of Xe+ ions at energies of 150, 500, 700 keV, depending on the experimental conditions. The simulation and irradiations were performed on thin film single crystal materials. The formation of dislocation loops, voids or bubbles, solid state precipitates and dislocation networks due to radiation were studied by simulation and compared to experiment.

The comparison was made for the displacements, vacancies of various target elements, ion ranges, that were of interest to the formation of Xe bubbles. We studied Xe-bubbles in the solid state when the internal bubble pressure was sufficiently high. The void and bubble formation rates are estimated based on a new mesoscale approach that combined experiment with the kinetic models validated by atomistic and Ab-initio simulations, that show its dependence on irradiation dose and irradiation temperature.


Author(s) affiliation:
Zeke Insepov*, Argonne National Laboratory, United States
Di Yun, Argonne National Laboratory, United States
Jeff Rest, Argonne National Laboratory, United States
Abdellatif Yacout, Argonne National Laboratory, United States

*presenting author
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