Tin clusters in silica presenting abnormally high thermal stability
invited presentation: 2010-08-23 02:01 PM – 02:30 PM
Last modified: 2010-06-14
Abstract
The thermal evolution of Sn nanocrystals (nC) produced by ion implantation into silica films is studied using Rutherford Backscattering Spectrometry, Transmission Electron Microscopy and Glancing Incidence Small Angle X-ray Scattering. Upon a two step annealing process, consisting of a low temperature long time aging treatment followed by high temperature furnace annealings (773 – 1373 K; 1800 s) in high vacuum, we demonstrate the formation of Sn nC with a modal diameter D~0.7 nm and a size dispersion from 0.4 to 1.8 nm presenting abnormally high thermal stability, characterized by a melting temperature of ~1300 K (i.e. 800 K above the melting of the bulk metallic phase). The results are discussed assuming a size dependent phase transition from metallic to covalent bounded crystals and compared with the literature data from free-standing nC. A model based on classical thermodynamics concepts is proposed. The model provides good fit to the experimental data, including the melting temperature depression with decreasing D up to a critical size Dc~2 nm, and the superheating behavior observed for D below Dc.
Author(s) affiliation:
Flavia P. Luce, Instituto de Física, Universidade Federal do Rio Grande do Sul, Brazil
Zacarias E. Fabrim, Instituto de Física, Universidade Federal do Rio Grande do Sul, Brazil
Dario F. Sanchez, Instituto de Física, Universidade Federal do Rio Grande do Sul, Brazil
Agenor Hentz, Instituto de Física, Universidade Federal do Rio Grande do Sul, Brazil
David Babonneau, Laboratoire de Physique des Matériaux, Université de Poitiers, France
Gustavo M. de Azevedo, Instituto de Física, Universidade Federal do Rio Grande do Sul, Brazil
Fernando C. Zawislak, Instituto de Física, Universidade Federal do Rio Grande do Sul, Brazil
Paulo F. P. Fichtner*, Escola de Engenharia, Universidade Federal do Rio Grande do Sul, Brazil
*presenting author