A nano imprint method can form fine polymer pattern on a substrate. The nano imprint method uses a mold having nano pattern fabricated such as ion beam lithography and polymer resin. So, anti-sticking problem was generated between the mold and the polymer resin. In this study, we report that the carbon coat layer was used as the anti sticking layer of nano imprinting mold. In this article, we proposed that the mold was covered with the deposited carbon, which was the anti sticking layer for nano imprinting mold. Our method was efficient and economical without special equipment. The mold that made from the pyrex glass was fabricated by focused ion beam lithography. The line width were 200nm -800nm, and pattern pitch were 200nm~800nm. All line depth was 400nm. Thickness of the carbon layer fabricated by evaporating system was 20nm. The carbon coat mold was applied for thermal nano imprinting and UV nano imprinting. After imprinting, the resin was removed from mold by mechanical lift-off process. Transferred pattern was observed and confirmed by the scanning electron microscope (SEM). Then the pattern transfers from mold to resin was succeeded. 

Masanori Ishizuka*, Institute of Industrial Science, The University of Tokyo, Japan
Yoshikazu Teranishi, Tokyo Metropolitan Industrial Technology Research Institute (TIRI), Japan

*presenting author