In-plane controlled patterning of nano-tracks in high-Tc superconductors by Heavy-Ion Lithography
poster presentation: Monday 2010-08-23 05:00 PM - 07:00 PM in section Focused ion beams, ion lithography
Last modified: 2010-07-02
Abstract
The paper reports on high precision equipment designed to modify over 3-dimensions (3D) by means of high-energy heavy ions the local properties of either HTSC (High temperature Superconductors) or functional oxides. A target-moving system aimed at creating surface ion-nanostructured patterns (extending the nanostructures across the volume as columnar tracks) [1] is driven by an x–y writing protocol allowing to modify beam sensitive samples over millimeters size regions by drawing whatever programmed shapes. The moving system has a mechanical resolution of 15 nm. A high precision ion fluence control and measurement system allows the on-line monitoring of the delivered dose. The set up has been used for different geometries patterned on beam sensitive sheets as well as on superconducting materials. In the last case the 3D properties modulation consists of amorphous nanostructures. The final issue concerns the technical solutions as well as the calibration procedures needed to suitably guiding the uniform part of the beam towards the final collimator and to the targets in accordance with the beam diagnostic. Finally several examples of patterning of superconducting sensors, aimed at magnetic field as well as photo detection in selected spectral regions up to THz domain, are shown.
[1] A. Rovelli, et al. – Nucl. Instrum. Methods Phys. Res. B 240 (2005) 842
Author(s) affiliation:
Antonino Amato, INFN - LNS, Italy
Roberto Gerbaldo, Politecnico di Torino, Italy
Gianluca Ghigo, Politecnico di Torino, Italy
Laura Gozzelino, Politecnico di Torino, Italy
Francesco Laviano, Politecnico di Torino, Italy
Enrica Mezzetti*, Politecnico di Torino, Italy
*presenting author