Negative-Ion Beam Modified Polymeric Surfaces for Controls of Individual Cell Arrangement and Cell-Nucleus Orientation
poster presentation: Tuesday 2010-08-24 05:00 PM - 07:00 PM in section Modification of polymers and biomaterials
Last modified: 2010-06-02
Abstract
Carbon negative-ion implantation into polystyrene (PS) and silicone rubber (SR) could be used to pattern adhesions of rat mesenchymal stem cell (MSC) and its differentiated neuron due to hydrophilic treatment on the irradiated areas. For artificial network fabrication, the clear fine patterns of cell-body and long neurite outgrowth are required. Controlling of individual cell arrangement and nucleus orientation were investigated by decreasing the implanted line-width. Carbon negative ions were implanted into PS and SR at energy of 10 keV and fluences of 3×1014 and 3×1015 ions/cm2, respectively. To observe the suitable line-width for individual cell arrangement and nucleus orientation control, two masks of the ridge pattern having slit apertures range of 0 – 40 µm in width and that of rectangular pattern having various slit apertures of 5 – 40 µm in width were used. After 2 days culture of MSCs, cell nuclei were observed by fluorescent microscopy with staining of 4’, 6-diamino-2-phenylindole (DAPI). The nucleus positions at each tip line region and the relative angles between the major axis of ellipse-shaped nucleus and the implanted line region were evaluated for individual cell arrangement and for nucleus orientation control, respectively. Results showed arrangement of individual cell along the narrowed line-width of 3 – 12 µm on both polymers and increasing of percentage at orientation of 0˚-10˚ to the line region with a decreasing in the line-width from 40 to 10 µm for 45% to 79%. As a result, the suitable line-width to control the arrangement and orientation was at 10 + 5 µm.
Author(s) affiliation:
Hiroshi Tsuji, Department of Electronic Science and Engineering, Kyoto University, Japan
Hiroko Sato, Department of Electronic Science and Engineering, Kyoto University, Japan
Yasuhito Gotoh, Department of Electronic Science and Engineering, Kyoto University, Japan
Junzo Ishikawa, Department of Electronics and Information Engineering, Chubu University, Japan
Gikan H. Takaoka, Photonics and Electronics Science and Engineering Center, Kyoto University, Japan
*presenting author