Deposition mechanisms of gas-phase metal clusters on self-assembled-monolayers
poster presentation: Monday 2010-08-23 05:00 PM - 07:00 PM in section Cluster ions, single ion, swift heavy ions, highly charged ions
Last modified: 2010-06-02
Abstract
Recently, cluster deposited on self-assembled monolayers have attracted a great interest. Metal clusters interact in many different ways with organic surfaces. The possibility to control the size and morphology of deposited clusters and tune their properties, makes self-assembled monolayers (SAMs) well-suited for studies and applications in nanoscience and nanotechnology. Thus a better understanding of the interaction between clusters, the organic layer and the substrate should be assessed as a starting point towards further possible applications. We report on investigations of low deposition energy (0.3 eV/atom) of gas-phase metal clusters on dodecanethiol self-assembled monolayers (SAMs) on a Au(111) substrate. The deposition of pre-formed clusters in the gas phase offers the possibility to control the size and morphology of deposited clusters and tune their properties, unlike single-atom deposition by molecular beam epitaxy (MBE) methods, where the nanostructures properties are strongly dependent on the cluster-substrate interaction.
Combining the experimental measurements to molecular dynamics simulations, we obtain a description of the clusters penetration mechanism and a better understanding of the cluster-SAMs interactions.
Author(s) affiliation:
Tommi T. Järvi, ,
Minna Räisänen, ,
Vladimir Tuboltsev, ,
Jyrki Räisänen, ,
*presenting author