17th International Conference on Ion Beam Modification of Materials

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Ion beam surface modification of materials for high-temperature technology

Hans-Eberhard Zschau* and Michael Schütze

poster presentation: Tuesday 2010-08-24 05:00 PM - 07:00 PM in section Modification of semiconductors, metals and ceramics
Last modified: 2010-06-02

Abstract


Most technical Ni-base alloys are so-called borderline materials from an oxidation point of view, i. e. their Al contents of 3-5 wt.-% are not sufficient to form a continuous dense and protective aluminium oxide layer on the surface. For this reason usually coatings are applied with Al contents of 8 wt.-% and higher. Unprotected Ni-base borderline alloys form a fast growing mixed oxide scale. Underneath the fast growing oxide scale internal oxidation takes place leading to discrete aluminium oxide particles which do not form a continuous diffusion barrier. Dense continuous and slow growing protective alumina scales can, however, be achieved even on borderline Ni-base metals by applying the halogen effect. Following Wagner`s theory of oxidation the formation of a dense alumina scale can be obtained, if the Al-activity on the surface is increased. The halogen effect was used as a method to increase the  Al-activity. Thermodynamical calculations for the alloys IN738  and IN939 show the existence of a region for a positive fluorine effect. Fluorine ion implantation was used to transform the thermodynamical predictions into F-concentrations on the metal surface. After oxidation (60h/1050°C) a protective alumina scale was found for  IN738. The oxidation protection still works after 1000 hours. However no protective scale was obtained for IN939. The PIGE was applied to study the F-loss during heating. The data reveal the limits of the thermodynamical predictions and explain the experimental results. The implantation of reactive elements (e. g. Y) improves the scale adherence.


Author(s) affiliation:
Hans-Eberhard Zschau*, DECHEMA Gesellschaft für Chemische Technik und Biotechnologie e. V., Germany
Michael Schütze, DECHEMA Gesellschaft für Chemische Technik und Biotechnologie e. V., Germany

*presenting author
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