17th International Conference on Ion Beam Modification of Materials

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Ion-beam-synthesized semiconductor and metal nanoclusters in oxide matrices

David Tetelbaum*, Alexey Mikhaylov, Alexey Belov, Alexey Kostyuk, Ilia Zhavoronkov, Ivan Antonov, Maria Shenina, Alexander Dudin, Dmitry Antonov, Alexander Kasatkin, Oleg Gorshkov, and Vladimir Burdov

poster presentation: Monday 2010-08-23 05:00 PM - 07:00 PM in section Nanostructure synthesis and modification
Last modified: 2010-06-02

Abstract


Semiconductor and metal nanoclusters in dielectrics have a great importance for current optoelectronics, particularly for fiber-optics communication and integrated circuit interconnects, solar cells, etc. Mixed ensembles of both types of particles embedded into one and the same dielectric matrix that may also contain rare earth elements (Er, which emit light at the communication wavelength 1.54 µm) are the most promising systems. In this work, such systems were ion-beam-synthesized in SiO2, Al2O3 and ZrO2(Y) matrices. Si+ ions were implanted at 100 keV and doses 5·1016-3·1017 cm-2. Au and Ag with an average ion charge 2.1 were implanted in pulse mode at 60-80 keV (5·1015-1.2·1017 cm-2). The matrix nature is found to have considerable effect on the formation process and properties of the nanoclusters. Si+ implantation into single-crystal Al2O3 (sapphire) leads to formation of Si nanocrystals that emit light only after annealing in oxidizing atmosphere. Au and Ag implanted into SiO2 and Al2O3 form nanoclusters even without annealing and their concentration increases with dose and annealing temperature. Due to a high vacancy concentration and oxygen mobility, the situation for the ZrO2(Y) is more complicated: Au precipitation competes with formation of Zr nanoclusters; the latter disappear at annealing in air. The current-voltage characteristics of the Au-implanted ZrO2(Y) thin films have a series of maxima associated with resonance tunneling. Phenomena of energy exchange between metal, semiconductor nanoclusters and rare-earth centers in dielectric matrix are considered.

Support through the Federal Targeted Programme "Scientific and pedagogical cadres of innovative Russia", grant of the RF President (MK-185.2009.2) and RFBR project (10-02-00995) is gratefully acknowledged.

 


Author(s) affiliation:
David Tetelbaum*, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Alexey Mikhaylov, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Alexey Belov, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Alexey Kostyuk, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Ilia Zhavoronkov, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Ivan Antonov, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Maria Shenina, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Alexander Dudin, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Dmitry Antonov, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Alexander Kasatkin, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Oleg Gorshkov, Physico-Technical Research Institute of N.I. Lobachevski State University of Nizhny Novgorod, Russian Federation
Vladimir Burdov, University of Nizhny Novgorod, Russian Federation

*presenting author
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